CMU College of Makeup Art & Design is a Toronto-based specialist institution for professional makeup artistry, founded in 1987 and affiliated with Yorkville University.
CMU College of Makeup Art & Design was established in Toronto, Canada, in 1987. For nearly 40 years it has been recognized as one of North America's leading specialist institutions dedicated to professional makeup artistry. The college describes itself as setting the international standard for advanced makeup artistry education.
CMU's Diploma and Certificate Programs prepare graduates for work in fashion, film, television, theatre, editorial, special effects, prosthetics, and creature design. Certificate programs are designed for students interested in a specific area, such as hairstyling, fashion and editorial makeup, or creature design. Students can use course credits from diploma programs towards a Bachelor of Creative Arts degree at Yorkville University. The college describes its faculty as award-winning and internationally acclaimed.
Over four decades, CMU has trained more than 5,000 makeup artists in North America, special effects designers, prosthetic artists, and creative professionals from Canada, USA, Central America and Europe. CMU graduates have participated in hundreds of film and television productions, including major Hollywood projects, international media productions, fashion campaigns, and commercial productions.
Listed campus facilities include classrooms, a photography studio, exhibition space, a makeup effects lab, The Face Station, a student lounge, and Home Stay housing. The college is located at 110 Lombard Street, Toronto, ON M5C 1M3.
Admission routes include the Ontario Secondary School Diploma or equivalent and age-based admission with the Scholastic Level Exam (SLE). International students may apply with an Ontario Secondary School Diploma or equivalent, or at age 18 or older with the SLE. The college is also establishing the CMU Global AI Arts & Creative Technologies Center, intended as an interdisciplinary research platform.